U.S. Ambassador praises IPR work in Shanghai

Post time:09-10 2008 Source: IPR in China Author:
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On September 2, the U.S. Chamber of Commerce in Shanghai held an annual dinner to thank the Government of Shanghai.

Vice Mayor Tang Dengjie, U.S. Ambassador Mr. Clark T. Randt Jr., and Chairman of American Chamber of Commerce Mr. J. Norwell Coquillard addressed the meeting.

U.S. Ambassador Mr. Clark T. Randt Jr. said in his speech that Shanghai's IPR protection and management level is among the highest in China. Shanghai has taken the lead in formulating local IPR strategies, made remarkable achievements in IPR protection system construction and intensified the IPR enforcement, which helps to maintain good investment environment and is highly praised by US-funded enterprises.

It is learnt that this is the eighth dinner held by U.S. Chamber of Commerce in Shanghai. Officials from Shanghai Municipal People’s Government and members of the Chamber of Commerce attended the event and made exchanges. [Chinese version is available on shanghai.gov.cn]

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